Search

MSP's SPx Calibration Standards are precision engineered tools for the calibration, verification and re-qualification of the most common wafer surface inspection systems used in semiconductor manufacturing. These standards play a crucial role in ensuring the accuracy and...

Understanding the sources of particle shedding and impacts on yield is essential for effective mitigation strategies.

*Diese Seite ist leider nur in Englisch verfügbar.*The 2821 Turbo-Vaporizer™ is our highest liquid flow rate unit. This model features 3600W of heater power and can be used to deliver flow rates up to 6000g/hr (TEOS or equivalent).

From the meticulous assembly of satellites and spacecraft to the intricate fabrication of composite materials for jet engines, every step demands seamless integration of cutting-edge technology and expert craftsmanship, based on precision and reliability. Avionics systems...

MSP transformed cobalt thin-film deposition for a global semiconductor giant struggling with CCTBA vaporization, including low vapor pressure and thermal instability, leading to clogging and downtime.

Durchfluss 0,1 CFM (2,83 LPM), 1 CFM (28.3 LPM) / Kanalgrößenoptionen 0,2 bis 25 μm

Reticle/photomask contamination standards consist of particles deposited on 6 inch reticles with the industry's best particle size and count control. These certified standards for reticle inspection tools are totally customized for each customer.

Wafer contamination standards consist of particles deposited on a wafer (sizes from 100 mm to 450 mm) with the industry's best particle size and count control. These certified standards for wafer inspection tools are totally customized for each customer.

PRE Challenge Wafers are an affordable solution for Particle Removal Efficiency (PRE) testing resulting in reliable cleaning system validation.