Nano LPM System

Détails du produit

The TSI Nano LPM™ System is engineered to close the critical metrology gap in ultrapure water (UPW) monitoring. It provides confident detection of both suspended nanoparticles and dissolved content down to 10 nm, delivering the linear, matching, and repeatable performance required for modern semiconductor fabs. The TSI Nano LPM™ System empowers process engineers and quality managers to make proactive, data-driven decisions that reduce downtime, optimize maintenance, and protect yield.

TSI Nano LPM System includes a specialized generator that aerosolizes UPW, paired with a cleanroom-ready, water-based condensation particle counter (CPC) that enables accurate and dependable measurements.

Applications

• Continuous, online monitoring of UPW main supply and at points-of-use. 
• Detection of particle excursions and breakthrough events.
• Baseline trending and analysis for process control.
• Evaluation of filter and resin efficiencies to optimize preventative maintenance schedules.
• Quantification of UPW quality improvements after system upgrades.
• Parts cleanliness – verify sensitive components meet specifications before integrating into critical tools.

Where to Install

Check out Application Note CC-133: UPW Monitoring Locations for the TSI Nano LPM System (View US | View A4) to read about the variety of installed monitoring locations in semiconductor fabrication factories (fabs) for enhanced process control using the Nano LPM™ System.

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