Search

Débit 0.1 CFM (2.83 LPM) / Options de taille de canal 0.2 à 25 μm / Pompe intégrée

Lorsque votre application nécessite des particules nanométriques aérosolisées (virus, protéines ou nanoparticules synthétiques), le Générateur d'aérosols par électro-nébulisation (EAG), modèle 3482, est adapté. En plus de permettre la caractérisation de nanoparticules...

We offer cutting-edge solutions tailored to the unique (nanoscale) challenges of the semiconductor manufacturing market. With our advanced instrumentation and expertise, we provide critical tools for process control, quality assurance, and cleanroom monitoring. Stay ahead of...

Discover how MSP's Particle Deposition System enables precise calibration of defect inspection systems crucial for maintaining high yields and quality in sub-10nm semiconductor devices.

Discover the latest advances in semiconductor manufacturing with our webinar on liquid source vaporization. Explore the challenges of CVD and ALD processes, and unveil the MSP Turbo II™ Vaporizer.

In this video, discover the key components of a Direct Liquid Injection (DLI) system and how they work together to deliver stable, consistent vaporization.

MSP’s NanoSilica™ Size Standards are concentrated suspensions of amorphous SiO2 particles with highly uniform size distributions, suspended in ultra-pure water (UPW).