Liquid Flow Controllers

Precision Control for Thin Film Deposition

In the realm of semiconductor manufacturing, the precise delivery of liquid precursors is critical for film quality and uniformity. MSP Turbo™ Liquid Flow Controllers utilize advanced measurement technology to regulate flow rates with exceptional accuracy. This precision helps minimize fluctuations in vapor delivery, which is essential for processes like Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD). By maintaining tight control over liquid flow, these devices assist in achieving consistent film thickness and composition across the wafer.

Efficiency and Waste Reduction

Minimizing waste is a key objective for any fabrication plant looking to manage costs. The MSP Turbo™ LFC is designed to respond quickly to setpoint changes, reducing the amount of expensive precursor liquid wasted during stabilization periods. This responsiveness not only helps lower material costs but also supports faster process cycle times. The controller’s ability to handle a wide range of liquid properties makes it a versatile asset for both R&D pilot lines and high-volume manufacturing environments.

Seamless System Integration

Integrating new components into complex process tools can be challenging. MSP Turbo™ Liquid Flow Controllers are engineered for straightforward integration, featuring standard communication protocols and compact form factors. Whether you are upgrading an existing tool or designing a new deposition system, these controllers facilitate a smoother installation process. Their robust design supports long-term reliability, helping to reduce maintenance requirements and support continuous, uninterrupted production.