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Why Semiconductor Teams Choose This Solution?
The particles that matter most are the ones you can't see.
Conventional liquid particle counters stop at 20 nm, misidentify bubbles, struggle with mixed particle populations, and introduce composition-dependent bias. TSI's Aerosol Generator + SMPS system closes that gap, delivering metrology-grade characterization where yield risk is highest.
- Sub-20 nm Particle Sizing: Measure filter retention at particle sizes no optical instrument can reach. Identify pass-through contamination before it reaches the wafer — not after yield loss appears.
- Multi-Modal Size Distributions: Accurately resolve complex, multi-peak particle populations in a single scan. Know exactly what your filter is — and isn't — capturing, across the full size range.
- Filter Lifetime Quantification & Rinse-Down Readiness: Eliminate guesswork from filter change intervals. Generate data-driven loading curves that tell you when a filter is truly ready — reducing both premature replacement cost and the risk of running a degraded filter.
- No Bubble Miscount: Aerosol-based detection cannot register bubbles as particles — a known failure mode of optical instruments that can trigger false alarms or, worse, mask real contamination events.
- Independent of Refractive Index: Results are unaffected by optical particle properties
- Metrology-Grade Technique: CPC/SMPS methods are used by national metrology laboratories worldwide. Results that hold up to scrutiny — in qualifications, audits, and supplier conversations.
How It Compares to Traditional Techniques
| Attribute | Liquid Particle Counter | TSI® Aerosol Generator + SMPS New |
|---|---|---|
| Min. detectable size | 20 nm | <20 nm |
| Size resolution | ~4 channels | >100 channels |
| Bubble interferance | Yes | None |
| Multi-modal accuracy | None | High |
| Refractive index dependent | Yes | Independent |
| Metrology traceability | Partial | Established |
Applications for Semiconductor Professionals
Every application below maps directly to yield protection or risk reduction in your fab:
- Filter Qualification & Efficiency Testing - Particle retention characterization by size down to below 2.5 nm.
- UPW Filtration Efficiency - Quantify ultrapure water filter performance below 20 nm — the size regime where conventional counters go blind and contamination risk is highest.
- Filter Lifetime & Replacement Decisions - Replace filters on evidence, not schedule. Data-driven replacement intervals reduce both over-spend and the risk of a degraded filter reaching critical process steps.
- High-Purity Chemical & Liquid QC - Extend the same sub-nm insight to specialty chemicals, solvents, and process liquids — anywhere an uncharacterized particle population is an unacceptable risk.
Measurement Setup and Results
