蒸发器

Vaporizers are used in gas phase processes to transition a liquid into a gas for thin film deposition or other processes that require a vapor (metal etch, doped epitaxial growth, etc). Vaporizers are widely used in:

CVD (Chemical Vapor Deposition)
PECVD (Plasma-Enhanced Chemical Vapor Deposition)
MOCVD (Metal-Organic Chemical Vapor Deposition)
ALD (Atomic Layer Deposition)

Wider Process Window. Improved Film Quality. Less Maintenance.

MSP Turbo™ Vaporizers use a droplet vaporization, direct liquid injection technique. Our vaporizers (also known as liquid source bubblers or CVD bubblers) use advanced technology in aerosol science and thermo-dynamics to create a more refined solution to vaporizing liquids.

In thin film applications, MSP Turbo™ Vaporizers’ stable and uniform vapor leads to a higher quality thin film and higher wafer yields with less down time. MSP Turbo™ Vaporizers provide faster response time, high precision flow control, are able to operate at high temperatures, and are built with a clog-resistant design.

Find your Vaporizer

Use our interactive product selector to find the right vapor delivery solution for your CVD thin film application.

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Features and Benefits:

Extremely stable concentration output
Low temperature vaporization/reduced risk of thermal decomposition
Longer Mean Time Between Repair (MTBR)
Ability to vaporize difficult precursors
Direct liquid injection - vapor on demand
Higher vapor concentration potential
Clog-resistant design

Applications include:

Semiconductor Microelectronics
LEDs Optoelectronics
Protective Coatings
Nanoparticle Synthesis
Energy Production/Storage
Powder/Fiber Processing
Solar Photovoltaic
Medical Device
Bio Assays

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Filters are an important part of reducing CVD defects

Learn more by downloading our white paper on reducing CVD defects with post-vaporization filtration

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Turbo Vaporizer 2821

										The 2821 MSP Turbo™ Vaporizer is our highest liquid flow rate unit. This model features 2400W of heater power and can be used to deliver flow rates up to 6000g/hr (TEOS or equivalent).

High-Flow Turbo II Vaporizer 2855PE

										MSP's Turbo II™ Vaporizer 2855PE is designed for high-precision microelectronic applications that require mid to high vapor flow rates. Based off of the field proven, highly reliable, and low-maintenance MSP Turbo™ Vaporizers, the new 2855PE delivers twice the vapor output in a footprint that is half the size.

High-Flow Turbo II Vaporizer 2855NP

										MSP's Turbo II™ Vaporizer 2855NP is designed for applications that require mid to high vapor flow rates. Based off of the field proven, highly reliable, and low-maintenance MSP Turbo™ Vaporizers, the new 2855NP delivers twice the vapor output in a footprint that is half the size. The 2855NP has a liquid shut-off valve, and can be used with any liquid flow controller that has an integrated flow control valve.

Low-Flow Turbo II Vaporizer 2852PE

										MSP's Turbo II™ Vaporizer 2852PE is designed for high-precision microelectronic applications that require low to mid vapor flow rates. Based off of the field proven, highly reliable, and low maintenance MSP Turbo™ Vaporizers, the new 2852PE provides stable vapor concentrations while maintaining a very small footprint. The 2852PE also features an on-board flow control valve for extremely fast flow-rate response.

Low-Flow Turbo II Vaporizer 2852NP

										MSP's Turbo II™ Vaporizer 2852NP is designed for applications that require low to mid vapor flow rates. Based off of the field proven, highly reliable, and low-maintenance MSP Turbo™ Vaporizers, the new 2852NP provides stable vapor concentrations while maintaining a very small footprint. The 2852NP also has a liquid shut-off valve, and can be used with any liquid flow controller that has an integrated flow control valve.