SEMICON Japan 2024
TSI® and MSP, a Division of TSI®, invite you to SEMICON Japan 2024 to explore our advanced solutions for precision, quality control, and reliability in semiconductor manufacturing to ultimately increase yield.
Why Visit Our Booth?
As semiconductor manufacturing scales down to the nanoscale, TSI and MSP deliver innovative tools to address critical challenges:
- NEW Nanoparticle Monitoring in Ultrapure Water — TSI Nano LPM™ System for true 10 nanometer (nm) nanoparticle detection in semiconductor ultrapure water (UPW)
- Parts Cleanliness Testing — Ensure reliability with precise cleanliness evaluations down to 2 nm
- Particle Detection in Hugh-Purity Gases — Reliable and repeatable measurements down to 2 nm
- Airborne Particle Monitoring — Advanced systems for monitoring airborne particles as small as 10 nm
- Vapor Delivery Solutions — Optimize thin-film deposition with our advanced Direct Liquid Injection (DLI) tools
- Calibration Standards — Support for surface scanning and inspection tool calibration down to 10 nm
- CMP Slurry Analysis — Gain single-particle insights for precise slurry size distribution.
- PRE Challenge Wafers — Validate particle removal efficiency with confidence.
Don't Miss Our Exhibitor TechSpot Talk
TSI Nano LPM™ System
Empowers Data-Driven Decision in Ultrapure Water...
Like Never Before
Friday, December 13 | 10:30-10:50 a.m. | East Hall 5
Listen to TSI® Technology Expert, Mike Turnure, introducing the TSI Nano LPM™ System — a breakthrough in 10 nm detection in semiconductor ultrapure water (UPW). It represents a significant leap forward for semioconductor manufacturers who need reliable, real-time UPW monitoring at the 10 nm level.
Partnering for Tomorrow
TSI and MSP are your trusted partners in navigating the complexities of nanoscale semiconductor manufacturing. With a focus on innovation, precision, and efficiency, we help you stay competitive in a rapidly evolving industry.
Join us at SEMICON Japan 2024 and shape the future of semiconductor technology together!