Search

*Merci de noter que cette page est disponible en anglais uniquement.*This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high...

*Merci de noter que cette page est disponible en anglais uniquement.*Filtration down to 1 nm and below

*Merci de noter que cette page est disponible en anglais uniquement.*PRE Challenge Photomasks offer a cost-effective solution for Particle Removal Efficiency (PRE) testing, ensuring dependable validation of cleaning systems.

*Merci de noter que cette page est disponible en anglais uniquement.*This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high...

Flow Rate 1 CFM (28.3 LPM) - 3.5 CFM (100 LPM) / Channel Sizes 0.3 µm to 10 µm,(6) user selectable channels. Check out series of Videos & Quick Tips here.

Process Particles™ Suspensions are used as particle material standards. They represent real-world contaminant particles encountered in semiconductor device fabrication processing.