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With its rapid response time and advanced feedback capabilities, the Turbo™ LFC is set to revolutionize CVD and ALD processes.

Débit 0.1 CFM (2.83 LPM), 1 CFM (28.3 L/min) / Options de taille de canal 0.2 à 25 μm 

Reticle/photomask contamination standards consist of particles deposited on 6 inch reticles with the industry's best particle size and count control. These certified standards for reticle inspection tools are totally customized for each customer.

Wafer contamination standards consist of particles deposited on a wafer (sizes from 100 mm to 450 mm) with the industry's best particle size and count control. These certified standards for wafer inspection tools are totally customized for each customer.

PRE Challenge Wafers are an affordable solution for Particle Removal Efficiency (PRE) testing resulting in reliable cleaning system validation.

Real-time monitoring ensures compliance, aids in root cause analysis, and supports continuous improvement, enhancing overall operational efficiency and regulatory adherence.

Explore the crucial yet often overlooked realm of photomask contamination standards in semiconductor manufacturing.

MSP's Particle Removal Efficiency (PRE) standards optimize cleaning, alerting when attention needed to avoid contamination-related losses.

*Merci de noter que cette page est disponible en anglais uniquement.*This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high...

*Merci de noter que cette page est disponible en anglais uniquement.*Filtration down to 1 nm and below