PRE Challenge Photomask Sets

Product Details

PRE Challenge Photomasks feature dry depositions of NanoSilica™ or PSL particles, ensuring precise size distributions and compositions. These photomasks are uniformly coated, allowing for consistent testing and calibration of your cleaning systems to achieve accurate performance assessments. This uniform deposition is essential for validating cleaning processes in semiconductor manufacturing, helping to prevent defects and enhance productivity and yield.

Choose the Right Particle Suspension

NanoSilica™ and PSL provide concentrated, uniform particle suspensions for spatial evaluation. Process Particles™ mimic real-world contaminants, offering precise assessments of size-dependent PRE without introducing external contaminants. Our depositions are NIST-traceable for added reliability and auditability.

Applications

• Research & Development: Develop and refine new cleaning systems.
• Manufacturing/Production: Validate systems prior to shipment and during installation/qualification.
• Operations & Service: Revalidate systems throughout their lifespan or post-maintenance.

Features and Benefits

• Dry deposition reduces aging effects.
• Accurate, repeatable standards across batches.
• Various substrates and particle types available.
• NIST-traceable suspensions for quality control.
• Cost-effective, triple-wrapped, and shippable packaging.

Standard Photomask* Offering

*Common non-standard options: MSP provides substrates/carriers, 200 mm wafers, inspection summary, smaller/larger particle size, pellicles, multispot.

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