SEMICON Japan 2026

TSI^® and MSP, a Division of TSI^®, will be exhibiting together once again at SEMICON Japan 2026.

As semiconductor manufacturing continues to advance, precise measurement and effective contamination control remain critical to maintaining process reliability and protecting yield. Visit our booth to explore solutions supporting particle monitoring, cleanliness verification, wafer inspection, and process control across semiconductor value chain.

 

What You'll See at Our Booth

TSI Semiconductor Monitoring Solutions

• Ultrapure Water Monitoring — Detect nanoparticles down to 10 nm with the TSI Nano LPM™ System
• Cleanroom Monitoring — Track airborne particle contamination across critical manufacturing environments
• Parts Cleanliness Testing — Verify the cleanliness of components used in semiconductor equipment and processes
• Particle Detection in High-Purity Gases — Detect particle contamination in critical process gases

MSP Semiconductor Process Solutions

• Particle Removal Efficiency Testing — Evaluate and optimize cleaning processes using PRE Challenge Wafers
• Wafer Contamination Standards — Calibration standards supporting surface scanning and inspection applications
• Vapor Delivery Solutions — Precise vapor delivery for ALD, CVD, and other thin-film processes
• CMP Slurry Analysis — Single-particle insights for slurry size distribution and characterization

 

Meet Tomorrow's Challenges with Nanoscale Expertise

TSI and MSP bring together particle measurement, contamination control, and process technologies to support manufacturers from R&D through volume production.

Stop by to connect with our team, discuss your measurement and process challenges, and learn how our solutions can support your applications.
 

Explore Our Portfolio of Semiconductor Solutions