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Reticle Qual-Dep Qualification Contamination Standards

商品编号: 2200-01-7002

MSP's Qual-Dep™ Reticle Qualification Contamination Standards are specifically designed to meet your exact tool qualification needs, providing reliable solutions for validating and aligning reticle inspection systems to ensure optimal performance and minimize risks in semiconductor manufacturing.

Product Details

Qual-Dep™ Reticle Qualification Contamination Standards are crafted to precise customer specifications, often following initial development using Dev-Dep™ Development Contamination Standards. These standards offer customizable attributes for each deposit on your reticle, including:

  • Deposit Pattern Type
  • Deposit Size and Position
  • Particle Material
  • Particle Size
  • Particle Count

Applications

  • Reticle inspection tool qualification
  • Reticle inspection tool traceable calibration
  • Inspection tool performance matching

Substrates

Deposits can be applied to various substrates, with a focus on reticles (photomasks). While customers often supply their own reticles, MSP also offers optical photomask blanks. Our services ensure precise deposition on customer-provided reticles, meeting specific requirements for defect inspection and quality control.

Substrate Type MSP-Supplied Substrate Sizes Customer-Supplied Substrate Sizes
Optical Reticle (Photomask) 6 inch x 6 inch x 1/4 inch (Blank Only) 6 inch x 6 inch x 1/4 inch (All Types)
EUV Reticle (Photomask) N/A 6 inch x 6 inch x 1/4 inch (All Types)
Pellicle N/A TBD*

Customizable Deposits

Our Reticle Qual-Dep™ Qualification Contamination Standards are tailored to customer specifications, often following initial development with Dev-Dep™ Development Contamination Standards. Customizable attributes for each deposit include:

  • Deposit Pattern Type: Spot, Full, Arc, Ring
  • Particle Material:
  • Particle Size: 10 nm – 20 μm (varies by particle type/material)
  • Particle Count: Minimum 100 particles per deposit
  • Pattern Width: Typically 10-30 mm (dependent on particle size)
  • Pattern Location: Specific to substrate

Features & Benefits

Qual-Dep™ Reticle Qualification Contamination Standards offer several advantages:

  • Exclusivity: Each standard has a unique part number, ensuring specific specifications and simplifying the ordering process.
  • Supply Chain Integration: MSP works with your supply chain to streamline purchasing, reduce substrate transport, and speed up delivery.
  • Record Management: We meticulously track deposition recipes and monitor key parameters to ensure quality and traceability.
  • Flexible Terms: MSP negotiates tailored terms for quantity, pricing, and lead times to meet your needs.

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Spec Sheets

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